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SURFTENS 300 WH
Contact angle measuring instrument with 3 axis wafer handling
robot for 200 and 300 mm technology


GENERAL SOFTWARE
implementation of user levels in software
connection to SPC via network interface card
operating system Windows 2000
automatic loadport recognition
automatic recognition of slot occupancy
automatic measurement recipes assigned to certain load
port (recipe mix up between different wafer sizes is avoided)
slot integrity is warranted
notching before measurement
Measurement data will be stored on local disc – any
backup storage on network server will be organized by customer
LAN compatible
Client software for result evaluation on office PC is
included
Manual operation mode (via joystick)
MEASUREMENT GENERAL
Dispense System
Syringe or other dispense system for one media (DI-water)
Tank with 10 ml media stock
Programmable droplet size
Automatic placement of the droplet on the wafer,
movement for droplet placement is programmable
Easy disassembly/cleaning of the dispense system
System capable for measurements with second liquid
MEASUREMENT
Tool/Software supports free definable measurement maps
The whole wafer surface for 12" must be in reach for
the dispense system (excluding edge area)
Complete automatic measurement (FOUP -> droplet
placement -> measurement -> droplet removal -> FOUP)
contact angles between 85° and 95° will be excluded
from measurement range of the tool
GENERAL HARDWARE
Wafer handling capability for 12" wafer /
and or 8" wafers
System guarantees slot integrity
Manual focus system OEG provides detailed instruction
for focus adjustment
OEG provides concept for maintenance, spare parts,
complete users guide
OEG provides instruction for change of syringe
Wafer chuck only defined by measurement characteristics
Air pressure, vacuum, exhaust is provided by customer
Customer provides 300mm wafers plus FOUPs for
development system setup
After measurement liquid will be evaporated by hotplate
Work place contains keyboard and mouse
TOOL CONFIGURATION
Configuration - unit description:
| No |
Item
|
|
Description |
| 1 |
Wafer handling
system |
|
3-axis wafer handling robot
FOUP opening system 300mm
Loadport (OCL) 200mm
Laser scanner
Vacuum endeffector Notching system |
| 2 |
SURFTENS
automatic |
|
3-axis-step
motor stepping motor driven wafer table
automatic dispense system
automatic droplet positioning (teachable)
illumination system
CCD camera with optics
Frame grabber
Fan Filter Unit (FFU, on customer request)
Software package |
| 3 |
Hotplate |
|
for liquid
removal only on customer request) |
| 4 |
PC |
|
PC, Flatscreen,
keyboard, mouse |
Technical Parameters for contact angle measurement
Contact angle measuring device SURFTENS 300 WH for the fully automatic
measurement of the wetting behavior of solids (e.g. wafers or glass substrates
for flat panel displays) under clean-room conditions, as well as for series
tests and systematic analysis. The SURFTENS automatic enables the reduction of
subjective factors and time involved for contact angle measurements in research,
quality- and production inspection.
For the software-controlled measurement and analysis of:
- the static and dynamic contact angle according to the Sessile Drop method;
- the wetting behavior on solid surfaces
- the surface free energy of solids and their components
The SURFTENS WH 300 consists of the basic instrument with the following
technical equipment:
- Single needle support with vertical and horizontal positioning;
- Measuring stage, for fully automatic accurate sample positioning;
- telecentric measuring lens;
- Video measuring system with high-resolution CCD-camera;
- High-performance video digitizing board (frame grabber) for the PC;
- Illumination with continuously adjustable intensity for a homogeneous back
lighting;
- Control and measuring electronics for the teach-in procedure, graphic
display with keyboard and video display
- Power supply by PC
- The 32-bit software SURFTENS developed for Windows NT/98/XP®;
- Control of the sample position in X-, Y-direction, the needle position in
Z-direction,
- Static and dynamic contact angle measurement according to the Sessile drop
method
- Calculation of the surface and interfacial tension from the sessile drops
- Calculation of the surface free energy of solids and their components
according to the theory of Wu,
- Statistics and measurement error analysis
- 3 axis wafer handling robot
- Loadport for 300mm wafer
- scanner for slot occupancy
- housing
Technical data for contact angle measurement
- sample size: 200mm / 300mm Si-Wafer
- Position accuracy ± 0.05 mm in the sample level;
- Range of contact angle measurement 1° … 180°
- Measuring methods: Sessile Drop method
- Clean-room classification: 100 (better on inquiry)
back print
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